IEEE

Atomic Layer Processes for Material Growth and Etching—A Review

Abstract: Material growth and etching processes that cause the formation or removal of one atomic or molecular layer at a time are becoming commonplace. Starting from the research labs, such atomic ...
C&EN

Controlled Electrochemical Etching of Nanoporous Si Anodes and Its Discharge Behavior in Alkaline Si–Air Batteries

† Ertl Center for Electrochemistry and Catalysis, Research Institute for Solar and Sustainable Energies (RISE), Gwangju Institute of Science and Technology (GIST), Gwangju 500-712 South Korea ‡ ...
IEEE

Optimizing Plasma Etching: Integrating Precise Three-Dimensional Etching Simulation and Machine Learning for Multi-Objective Optimization

Abstract: In modern semiconductor manufacturing, optimizing plasma etching processes is key for advancing technology and achieving profitable production. In this study, we propose an efficient process ...
ancient-origins

Ten Precariously Situated Cliffside Constructions from the Ancient World

Over the centuries, ancient people all over the world have built incredible structures on the sides of cliff faces. Some had a desire to be closer to the heavens and were searching for a sacred ...
C&EN

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O

Article Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to ...