In recent years, a printed circuit board (PCB) known as the thermoelectric separation boardhas emerged as an innovative ...
KLA Corporation ( NASDAQ: KLAC) Goldman Sachs Communacopia + Technology Conference 2025 September 10, 2025 12:30 PM EDT ...
Hafnium oxide (HfO2) is a promising material for advanced semiconductors, but it is also known for its challenging etching properties. A group of researchers from Japan and Taiwan has successfully ...
Tech Xplore on MSN
Halogen-free plasma technique achieves atomic-level etching of hafnium oxide for next-gen semiconductors
Hafnium oxide (HfO2) has attracted attention as a promising material for ultrathin semiconductors and other microelectronic ...
Photoresist dry film mainly consists of three parts: the polyester film layer (PET film), the photosensitive ...
Scientists successfully etched this hard-to-etch material at room temperature without using halogen gases for the first time.
Driven by the growing demands of artificial intelligence (AI) and hyperscalers, advanced process technologies are ...
About the Ultra ECDP Tool The Ultra ECDP tool is compatible with 6-inch and 8-inch platforms and accommodates 150 millimeter (mm), 159mm and 200mm wafer sizes. The system is configurable with two open ...
Altus Group is now offering the ASSCON VP 2200 vapour phase reflow system, the first dual-lane inline VP unit available in ...
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