The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...
It's a mistake to assume wafer clamp rings have to polyimide. Several other work about as well. Silicon wafers aren't the only things that lose material in the various etching steps of IC ...
Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...
Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
On September 4, the Wuxi Taihu International Expo Center welcomed a grand event in the semiconductor industry—the 13th Semiconductor Equipment and Core Components and Materials Exhibition (CSEAC 2025) ...
Tech Xplore on MSN
Halogen-free plasma technique achieves atomic-level etching of hafnium oxide for next-gen semiconductors
Hafnium oxide (HfO2) has attracted attention as a promising material for ultrathin semiconductors and other microelectronic ...
Integrating 2D materials into sustainable electronic devices presents key challenges, particularly in depositing or etching ...
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